Publications

AI-driven Simulation and Design Lab

Journals

Deep learning-based contour extraction for lithography patterns with minimal manual labeling
Author

Tae-Yeon Kim, Yun Hyoung Nam, Jaehoon Kim, Jinho Lee, and Do-Nyun Kim

Status
submitted
Year
2025
Date
2025-02-26

Name*: Contributed equally

Name: Corresponding author